ASML Holding world’s renowned producer of Lithography systems, recently announced the quick business acceptance of the TWINSCAN™ XT:1900i, which began its shipment in July 2007. The XT: 1900i make possible volume making of logic devices down to 32-nanometers (nm) and memory devices at 40-nm. Chipmakers required manufacturing slighter and denser integrated circuits to perk up the working of their chip designs to match up to the recent computing and customer electronics products.

The XT:1900i provides the uppermost numerical aperture (NA) in the commerce today (1.35), facilitating the optimum possible production resolution. The company targets to ship 15 to 20 XT: 1900i systems in the following year, including quite a few to Japanese chipmakers. It has been known that almost one-third of ASML’s 12 immersion systems produced this year’s third quarter was shipped to Japanese customers. Thus keeping this in mind, company is increasing its Japanese workforce to more than 200 employees.